Next Generation Epitaxy
epiray introduces Thermal Laser Epitaxy (TLE) – a novel technology for the deposition of high-purity thin films. Epiray is a spin-off of the Max Planck Society pioneering a new era of epitaxy research.
A new deposition technology that will significantly impact thin film research and production.
TLE adds significant flexibility and speed to thin-film research. Sources can be changed rapidly without breaking the vacuum, and almost any material can be used. Layers of ultra-high purity can be deposited. Multiple chambers can be used in parallel with one set of lasers, thus widely different materials can be used in parallel. Operating cost are low.
The first epiray Thermal Laser Epitaxy system has been installed at the Forschungszentrum Jülich, Germany. It will be used to develop further applications in quantum computation.
In-situ heating to extreme temperatures results in perfect surfaces for subsequent epitaxy. The image shows the RHEED pattern of a singular orientation of the sapphire surface reconstruction.
Our current product range consists of a complete TLE system (laser system with specialized vacuum chamber) and a laser heater for upgrading deposition systems to take advantage of our substrate heating technology. The laser heater can be used later as basic component to build up our TLE system.
STRATOLAS TLE System
THERMALAS Substrate Heater
Source evaporation by lasers
High-purity elemental sources are thermally evaporated by laser radiation. All elements can be evaporated within the same setup.
Laser substrate heating
With the direct light absorption by long-wavelength lasers, substrates can be heated in an ultrapure environment up to extremely high temperatures.
Vacuum technology and design
Epiray’s vacuum design strategy is specifically optimized for TLE. The chambers are compact with a minimalistic design.
epiray was founded in 2021 and is a spin-off of the Max-Planck-Institute for Solid-State Research in Stuttgart, Germany.